Science & Technology
Science and Technology
Science and Technology
Tue, February 10, 2009 New Cymer Light Source Brings Optical Performance Benefits to Next- and Current-Generation Immersion Lithography
SAN DIEGO--([ BUSINESS WIRE ])--[ Cymer ], Inc. (Nasdaq:CYMI), the market's leading developer of light sources used to pattern advanced semiconductor chips, announced today that its advanced [ XLR 600i ]—originally introduced as a 90 watt (W) light source—is now selectable to also operate at 60W. This new light source, the XLR 600iX, maintains the power optics technology developed for higher-powered applications, and is easily field-selectable to extend from 60W to 90W. The system also provides industry-leading performance improvements over the XLR 500i, developed for 32 nm double patterning applications that address critical dimension (CD) control and wafer yield. Advancements include a 1.5x improvement in wavelength and bandwidth stability, and a 2x improvement in dose stability. Additionally, chipmakers operating the XLR 600iX at 60W will experience improved power optics lifetimes, resulting in a lower cost of operation compared to the XLR500i.
"The launch of the XLR 600iX reinforces our commitment to support chipmakers with the latest technology and cost-effective solutions," said Ed Brown, president and chief operating officer of Cymer. "As an integral part of chipmakers' day-to-day operations, it is important to develop tools that will meet current and future lithography applications, without requiring additional future investment. Particularly in today's environment, extendible tools such as the XLR 600iX are necessary to minimize costs and maximize capital investment value."
The new XLR 600iX is available immediately, and will come equipped with [ Cymer's Gas Lifetime eXtension™ (GLX) ] technology, which reduces light source downtime during gas exchanges by a factor of 20, while improving CD uniformity. The platform will also offer [ Cymer's OnPulse™ LaserLife Program ], guaranteeing year-over-year per pulse cost savings for the life of the light source, and stable, predictable running costs that scale with the level of wafer production.
Forward Looking Statements
Statements in this press release that are not strictly historical in nature are forward-looking statements. These statements include, but are not limited to references to the XLR 600iX delivering improved performance and lower cost of operation, and all the other benefits of the XLR series of products; and the benefits of features such as the GLX2 control system. These statements are based only on current information and expectations that are inherently subject to change and involve a number of risks and uncertainties. Actual events or results may differ materially from those projected in these statements due to various factors, including but not limited to: the possibility that the XLR 600iX and features such as GLX may not perform as, or deliver the cost benefits, expected; new and enhanced product offerings by competitors; the timing of customer orders, shipments and acceptances; the rate at which semiconductor manufacturers take delivery of photolithography tools from the company's customers; delays or cancellations by customers of their orders; cyclicality in the semiconductor equipment industry; the demand for semiconductors in general, and, in particular, for leading-edge devices with smaller geometries; inability by the company to meet its production and/or product development schedules; and inability of the company to secure adequate supplies of critical components for its advanced products. For a discussion of these and other factors which may cause our actual events or results to differ from those projected, please refer to the company's most recent annual report on Form 10-K and quarterly reports on Form 10-Q, as well as other subsequent filings with the Securities and Exchange Commission. You are cautioned not to place undue reliance on these forward-looking statements, which speak only as of the date of this press release. All forward-looking statements are qualified in their entirety by this cautionary statement, and the company undertakes no obligation to revise or update any forward-looking statements to reflect events or circumstances after the date of this press release.
Semiconductor Industry
Cymer, Inc. is the market leader in developing light sources, used by nearly every major chipmaker around the world as the essential light source for DUV lithography systems. With more than two dozen global offices and company headquarters in San Diego, Cymer's newly launched products enable double patterning in an effort to facilitate 32nm lithography. The company is also leading the industry in the research, development and transition to extreme ultraviolet lithography (EUV), sourced by laser-produced plasma. Cymer is committed to developing and introducing new technologies that reduce cost of ownership for chipmakers while simultaneously improving productivity. Cymer maintains a Web site to which it regularly posts press releases, Securities and Exchange Commission (SEC) report filings, and additional information about Cymer. Interested persons can also subscribe to automated e-mail alerts or RSS feeds. Please visit [ www.cymer.com ].
