Science & Technology
Thu, March 3, 2011Wed, March 2, 2011Tue, March 1, 2011Mon, February 28, 2011Sun, February 27, 2011Sat, February 26, 2011Fri, February 25, 2011Thu, February 24, 2011Wed, February 23, 2011Tue, February 22, 2011Samsung Selects Veeco MOCVD System for Advanced GaN-Based Power Electronics Research
Published in Science and Technology on Monday, February 28th 2011 at 5:10 GMT by Market Wire
PLAINVIEW, N.Y.--([ BUSINESS WIRE ])--Veeco Instruments Inc. (Nasdaq: VECO) announced today that Samsung Advanced Institute of Technology (SAIT) in Korea has selected Veecoa™s [ TurboDisc® K465ia" Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System ] for advanced GaN on Si research for power electronics.
"The GaN power electronics market is expected to grow significantly in coming years, with potential applications in energy-efficient power conversion devices"
According to William J. Miller, Ph.D., Executive Vice President of Veecoa™s Compound Semiconductor Business, aBeing selected as a research partner for GaN on Si by SAIT is an important strategic R&D win for Veeco. We look forward to continuing to work with SAIT to commercialize this technology for high volume manufacturing of GaN-based power electronic devices.a
aThe GaN power electronics market is expected to grow significantly in coming years, with potential applications in energy-efficient power conversion devices,a according to Jim Jenson, Vice President of Marketing for Veecoa™s Compound Semiconductor Business. Veecoa™s MOCVD technology is well positioned to serve this emerging market.
The K465i incorporates Veecoa™s Uniform FlowFlange® technology for superior uniformity and excellent run-to-run repeatability. Low maintenance TurboDisc technology enables highest system availability, excellent particle performance and high throughput. The production-proven K465i provides ease-of-tuning for fast process optimization on wafer sizes up to 8 inches and fast tool recovery time after maintenance.
About Samsung Advanced Institute of Technology (SAIT)
SAIT is the Samsung Group's R&D hub, established in October 1987 as the incubator for cutting-edge technologies. SAIT creates disruptive technologies as well as new convergence technologies by combining Samsunga™s most advanced technologies. SAIT also conducts science-based research in promising new areas to uncover new growth engines for Samsung. For more information go to [ http://www.sait.samsung.com ].
About Veeco
Veeco makes equipment to develop and manufacture LEDs, solar panels, hard disk drives, and other devices. We support our customers through product development, manufacturing, sales and service sites in the U.S., Korea, Taiwan, China, Singapore, Japan, Europe and other locations. Please visit us at [ www.veeco.com ].
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2010 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases.Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
