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Active Rockets Compared

Reports that China Could Have Extreme ultraviolet (EUV) Lithography in 2026

The article from NextBigFuture discusses reports suggesting that China might develop its own extreme ultraviolet (EUV) lithography technology by 2026, potentially breaking the monopoly currently held by ASML, a Dutch company. EUV lithography is crucial for manufacturing advanced semiconductors with smaller, more efficient transistors. The development of this technology by China could significantly impact the global semiconductor industry, reducing reliance on foreign technology and possibly leading to advancements in China's domestic chip production capabilities. The article mentions that while there are doubts about the timeline and the technological challenges involved, such a development would align with China's broader goals of technological self-sufficiency and leadership in high-tech industries. It also highlights the geopolitical implications, as control over such advanced manufacturing technology could shift power dynamics in the tech sector. However, the article notes that even if China achieves this, the technology might still lag behind ASML's in terms of performance and efficiency.

Read the Full NextBigFuture Article at:
[ https://www.nextbigfuture.com/2025/03/reports-that-china-could-have-extreme-ultraviolet-euv-lithography-in-2026.html ]